imec’s Virtual Fab Underpins Strategies to Reduce the Carbon Footprint of Lithography and Etch Process Steps

 This week, at the 2023 Advanced Lithography + Patterning Conference, imec presents a quantitative assessment of the environmental impact of patterning in advanced IC manufacturing. A virtual fab has been developed in the imec.netzero modeling platform. The resulting analysis enables imec and its partners to assess current manufacturing choices, identify areas of focus, and project the future. In imec’s physical fab, environmentally friendly process solutions are explored for the high impact areas, which include the reduction of fluorinated etch gases, maximizing EUV scanner throughput, and reducing hydrogen and water consumption. 


https://www.semiconductor-digest.com/imecs-virtual-fab-underpins-strategies-to-reduce-the-carbon-footprint-of-lithography-and-etch-process-steps/

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